The DOMINO pica is the ideal choice for small batches, fast process development and short turnaround times. Whether used universities, research institutes, mints, pilot production environments or by smaller coating service providers, the compact system combines proven coating technologies with a high degree of flexibility. It is particularly suited for coating smaller components and applications where fast results, efficient development cycles and small batch sizes are essential.
- Fast and short batch times of 2-4 hours
- APA Arc, HiPIMS sputtering or hybrid technology
- Combination also with PACVD and nitriding process
- Small, compact system for PVD startups with a turnkey concept from Oerlikon Balzers
| Properties | DOMINO pica |
|---|---|
| Equipment type | compact (1 chamber door) |
| Usable coating volume | Ø 330 mm x 300 mm |
| Available coating modules | Arc, Sputter, HiPIMS, Hybrid, Nitriding |
| APA arc evaporators | 2 to 6 |
| Magnetron sputter sources | 1 to 3 |
| Available power supplies | DC, DC pulse, middle frequency (MF), HiPIMS, (RF upon request) |
| Available BIAS | Bipolar pulse, middle frequency |
| Plasma cleaning | All systems equipped with patented power etching process AEGD |
| Standard substrate table (others upon request) |
5 shafts |