The DOMINO micra meets the requirements of almost all challenges on one platform.
It allows a wide variety of technology according to customer requirements and is a perfect platform, especially as a HiPIMS system.
- APA Arc, HiPIMS sputtering or hybrid technology
- HiPIMS sputtering with 4 magnetrons and synchronized, bipolar pulsed BIAS
- Combination also with PACVD and nitriding process
- Retrofitting of various technologies depending on customer requirements
| Properties | DOMINO micra |
|---|---|
| Usable coating volume | Ø 450 mm x 500 mm |
| Available coating modules | Arc, Sputter, HiPIMS, Hybrid, Nitriding |
| APA arc evaporators | 3 to 12 |
| Magnetron sputter sources | 1 to 4 |
| Available power supplies | DC, DC pulse, middle frequency (MF), HiPIMS, (RF upon request) |
| Available BIAS | Bipolar pulse, middle frequency |
| Plasma cleaning | All systems equipped with patented power etching process AEGD |
| Standard substrate table (others upon request) |
6 shafts |