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METAPLAS.DOMINO micra

The METAPLAS.DOMINO micra meets the requirements of almost all challenges on one platform.
It allows a wide variety of technology according to customer requirements and is a perfect platform, especially as a HiPIMS system.

  • APA Arc, HiPIMS sputtering or HI3 technology
  • HiPIMS sputtering with 4 magnetrons and synchronized, bipolar pulsed BIAS
  • Combination also with PACVD and nitriding process
  • Retrofitting of various technologies depending on customer requirements
Properties METAPLAS.DOMINO micra
Usable coating volume Ø 450 mm x 500 mm
Available coating modules Arc, Sputter, HiPIMS, HI3, Nitriding
APA arc evaporators 3 to 12
Magnetron sputter sources 1 to 4
Available power supplies DC, DC pulse, middle frequency (MF), HiPIMS, (RF upon request)
Available BIAS Bipolar pulse, middle frequency
Plasma cleaning All systems equipped with patented power etching process AEGD
Standard substrate table
(others upon request)
6 shafts

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