BALORA® HALONA is a PVD coating engineered for high-demand plasma etching, offering exceptional chemical and abrasion resistance - meeting current and future semiconductor needs.
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BALORA HALONA Superior Corrosion Protection for Long-Lasting Semiconductor Performance
- Engineered to be virtually unreactive to fluorine plasma chemistries
- Ideal for sub-10 nm etch processes across both planar and complex-shaped chamber components
- Delivers low particle generation, extended component lifetime, high yield, and reduced cost of ownership (CoO)
- 100% dense coating
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