Choose your country / language

Enhanced Sputtering Improved coating quality through higher ionization degree

Enhanced Sputtering

Enhanced sputtering employs a low-voltage arc discharge in the centre of the chamber to create a plasma intensity several times greater than the basic sputtering procedure, and thus to produce a much higher degree of particle ionization in the gaseous phase.

  1. Electron beam source
  2. Argon
  3. Reactive gas
  4. Planar magnetron evaporation source (coating material)
  5. Components/Tools
  6. Low-voltage arc discharge
  7. Auxiliary anode
  8. Vacuum pump

© Copyright 2024 OC Oerlikon Management AG

Back to top keyboard_arrow_up

keyboard_arrow_up