Enhanced Sputtering

Enhanced Sputtering

Enhanced sputtering employs a low-voltage arc discharge in the centre of the chamber to create a plasma intensity several times greater than the basic sputtering procedure, and thus to produce a much higher degree of particle ionization in the gaseous phase.

  1. 1. Electron beam source
  2. 2. Argon
  3. 3. Reactive gas
  4. 4. Planar magnetron evaporation source (coating material)
  5. 5. Components/Tools
  6. 6. Low-voltage arc discharge
  7. 7. Auxiliary anode
  8. 8. Vacuum pump
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