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Enhanced Sputtering

Enhanced Sputtering

Improved coating quality through higher ionization degree

Enhanced Sputtering

Enhanced sputtering employs a low-voltage arc discharge in the centre of the chamber to create a plasma intensity several times greater than the basic sputtering procedure, and thus to produce a much higher degree of particle ionization in the gaseous phase.

Enhanced Sputtering Process
  1. Electron beam source
  2. Argon
  3. Reactive gas
  4. Planar magnetron evaporation source (coating material)
  5. Components/Tools
  6. Low-voltage arc discharge
  7. Auxiliary anode
  8. Vacuum pump

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