\uf1ad

METAPLAS.DOMINOOne technology platform – various possibilities

×
METAPLAS.DOMINO pica
METAPLAS. DOMINO micra
METAPLAS.DOMINO kila
METAPLAS.DOMINO kila flex
METAPLAS.DOMINO giga flex

Tailoring multiple modules to individual demands and building a great unit – this is the basis of the METAPLAS.DOMINO. State-of-the-art thin film equipment has been developed with the knowledge of nearly 30 years of experience in tool manufacturing industry.

For Oerlikon Balzers, this means offering efficient system solutions and even setting trends in surface treatment. The modular and flexible concept of the thin film equipment allows further expansions and upgrades.

  • Advantages

    Advantages

    • Flexibility, various modular expansion options
    • Indiviually tailored coatings
    • Minimised maintenance and demand of spare parts
    • Efficient after-sales service

    HI3 – High Ionization Triple
    Hybrid Technology (Arc+HiPIMS) combined with AEGD plasma etching:

    HI3
     
    HI3
    • Combined strength of 3 processes in one PVD system
    • Excellent adhesion, high deposition rate, smooth coatings, economic production
    • Innovative approach to the next generation of PVD coatings for various applications
    • HI3 technology allows to achieve a variety of layer architectures
    • With HI3 technology coatings can be tailored by a wide range of materials, by micro alloying, by doping and by design of layer architecture ... combined with economical production!
  • Specifications

    Equipment with integrated chamber

    Compact equipment in different sizes for all production needs.

      METAPLAS.DOMINO pica METAPLAS.DOMINO micra METAPLAS.DOMINO kila
    Properties
    METAPLAS.DOMINO pica
    METAPLAS.DOMINO micra
    METAPLAS.DOMINO kila
    Usable coating volume
    Ø 330 mm x 300 mm
    Ø 450 mm x 500 mm
    Ø 640 mm x 700 mm
    Available coating modules
    Arc, Sputter, HiPIMS, HI3, Nitriding, DLC, ta-C
    APA arc evaporators
    2 to 6
    3 to 12
    4 to 16
    Magnetron sputter sources
    1 to 3
    1 to 4
    1 to 4
    Available power supplies
    DC, DC pulse, HiPIMS, bipolar pulsed, MF (RF upon request)
    Plasma cleaning
    All systems equipped with patented power etching process AEGD
    Standard substrate table
    (others upon request)
    5 shafts
    6 shafts
    9 shafts
     

    Equipment with free chamber and two doors

    The flex versions are perfectly designed for future integration of newly developed technology as well as for example integration into automated production processes.

      METAPLAS.DOMINO kila flex METAPLAS.DOMINO giga flex
    Properties
    METAPLAS.DOMINO kila flex
    METAPLAS.DOMINO giga flex
    Usable coating volume
    Ø 640 mm x 700 mm
    Ø 1,200 mm x 1,500 mm
    Available coating modules
    Arc, Sputter, HiPIMS, HI3, Nitriding, DLC, ta-C
    APA arc evaporators
    4 to 16
    8 to 32
    Magnetron sputter sources
    1 to 6
    1 to 4
    Available power supplies
    DC, DC pulse, HiPIMS, bipolar pulsed, MF (RF upon request)
    Plasma cleaning
    All systems equipped with patented power etching process AEGD
    Standard substrate table
    (others upon request)
    9 shafts
    Up to 32 shafts
     
  • Downloads
  • Further information

    Further information


    Main modules

    Arc

    Arc

    The innovative APA evaporator technology (Advanced Plasma Assisted) is based on cathodic vacuum arc and offers diverse development possibilities for new layer architectures.

    Benefits:

    • High target utilisation result in low target costs
    • High deposition rates
    • Adjustable magnetic fields
    • Short target changing times
    • High plasma density
    • Reduction of macro-particles
    • Excellent coating adhesion

    HiPIMS

    HiPIMS

    HiPIMS stands for High-Power Impulse Magnetron Sputtering.

     

    Benefits:

    • High ionisation rate (similar to arc)
    • High power densities from 100 to 1000 W/cm2
    • Very high plasma density
    • Layer structures adjustable by plasma parameter settings
    • Very smooth coatings
    • Excellent coating adhesion
    • Deposition of dense coatings at low substrate temperatures
     

    Additional modules

    Sputter

    Sputter

    In the sputtering process, atoms are extracted from a target by bombardment with high-energy ions (Ar) and transformed into the gas phase. By combining the sputtered material with additional gases, a coating is deposited on the substrate.
     

    Benefits:

    • A wide range of materials can be sputtered
    • Diverse process variants available
    • Smooth coatings
    • Good coating adhesion on combination with power etching prozess AEGD

    Nitriding

    Nitriding

    With the nitriding module, a plasma nitriding process can be performed before a PVD and/or PACVD coating process in one system and one batch. Thereby a hardened layer can be produced which offers excellent support for the subsequent PVD/PACVD coating.

    Benefits:

    • Optimisation of tool and component properties
    • Substitution of expensive base materials
    • Significantly longer lifetimes
    • All PVD coatings can be applied

     

    DLC

    DLC

    DLC stands for Diamond-Like Carbon and refers to a group of extremely low friction amorphous carbon coatings. With the DLC module, different DLC coatings can be produced by using PVD and/or PACVD processes. Standard DLC coatings consist of metal free or metal containing carbon coatings.

    Benefits:

    • Excellent coating adhesion
    • High wear resistance
    • Low coefficient of friction
    • Smooth coatings

    ta-C

    ta-C

    ta-C stands for tetrahedral amorphous carbon without hydrogen and refers to a group of extremely hard and low friction amorphous carbon coatings. With the ta-C module different ta-C coatings can be produced.
     

    Benefits:

    • For higher temperature environments than DLC
    • Very high wear resistance
    • Excellent coating adhesion
    • Smooth coatings

     

Contact us