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Physical Vapour Deposition based processes


A view of the PVD process sputtering

What is PVD coating?

PVD stands for Physical Vapour Deposition. It is a process carried out under high vacuum and, in most cases, at temperatures between 150 and 500 °C.

How does the PVD process work?

In the PVD process the high purity, solid coating material (metals such as titanium, chromium and aluminium) is either evaporated by heat or by bombardment with ions (sputtering). At the same time, a reactive gas (e.g. nitrogen or a gas containing carbon) is added; it forms a compound with the metal vapour which is deposited on the tools or components as a thin, highly adherent coating. A uniform coating thickness is obtained by rotating the parts at a constant speed about several axes.

Coating properties (such as hardness, structure, chemical and temperature resistance, adhesion) can be precisely controlled.

PVD processes include Arc evaporation, Sputtering, Ion plating, and Enhanced sputtering.

As well as the commonly known PVD processes, Oerlikon Balzers also offers several in-house developed processes.