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BALORA HALONA

BALORA HALONA Superior Corrosion Protection for Long-Lasting Semiconductor Performance

Semiconductor etch chamber component

BALORA® HALONA is a PVD coating engineered for high-demand plasma etching, offering exceptional chemical and abrasion resistance - meeting current and future semiconductor needs.

BALORA HALONA
Coating material YOF
Coating technology Magnetron PVD
Coating colour clear
Coating hardness HIT [GPa]* ~ 12
Coefficient of friction (dry) vs. steel** ~ 0.6
Max. service temp. [°C]**** > 1000
Process temperature [°C] < 250
General remark All given data are approximate values, they depend on application, environment and test condition.
*Coating hardness HIT [GPa] Measured by nano indentation according to ISO 14577. For multilayers the hardness of the different layers varies. Hardness can be adapted to the application.
**Coefficient of friction (dry) vs. steel Determined by ball-on-disc test in dry condition with an Steel ball according to ASTM G99. During run-in the given values may be exceeded.
****Max. service temp. [°C] These are approximate values out of the field. Due to thermodynamic laws there is a dependency of pressure in application.

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