Historical Milestones

Historical Milestones
  • 1850
  • 1900
  • 1950
  • 2000
  • 2014
  • 1976

    Plasma-Therm Inc. founded as RF generator and analytical equipment company

  • 1978

    Plasma Therm shipped first RF based plasma process equipment.

  • 1979

    Balzers introduces the LLS 801 a batch sputter system to the market

  • 1983

    Balzers introduces the SWS the first single wafer sputtering system worldwide

  • 1985

    Industry first single wafer production plasma etch reactor by Plasma- Therm

  • 1986

    First production 200mm plasma etch equipment introduced to the market by Plasma- Therm

  • 1987

    Balzers launches their 1st gen. innovative high through-put PVD cluster tool called ...

  • 1988

    Balzers introduces the LLS 900, the second generation batch sputter system

  • 1991

    Plasma-Therm Inc. relocates production facility to Florida

  • 1993

    Multilayer Solutions

    Multilayer Solution: SDS 100
    Sputtering Solution: CDI 901 1000 Discs / hour
    Hard Disk Solution: CIRCULUS M8

  • 1993

    Merger between Balzers/Liechtenstein and Leybold group in Germany completed

  • 1994

    Sputtering Solution: CDI 915 1800 Discs / hour

  • 1994

    First ever Photomask plasma etch system introduced to the market

    Balzers introduces the LLS 502, the third generation batch sputter system

  • 1995

    Multi Layer Solution: SDS 131

    Sputtering Solution: CUBE

  • 1995

    Flagship Versalock multi-chamber platform for production wafer processing created

  • 1996

    Multilayer Solution: SPRINTER 500

    Hard Disk Solution: CIRCULUS M12

  • 1997

    Multilayer Solution BIG SPRINTER 500

    Sputtering Solution: TWISTER 1200 Discs / hour & CUBE LITE

  • 1997

    Unaxis introduces the CLUSTERLINE® 200 to the market

    Unaxis introduces the CLUSTERLINE® 200 to the market, which is their 3rd gen. multi-chamber PVD cluster tool for up to 200 mm wafers.

  • 1998

    Sputtering Solutions

    Sputtering Solution: TWISTER 2 1450 Discs / hour & COMET & SWIVEL98 2200 Discs / hour
    Hard Disk Solution: CIRCULUS M14

  • 1999

    Multilayer Sputtering Solution: Multi SPRINTER 1500 & SPRINTER 750

  • 2000

    Multilayer Sputtering Solution: DVD Sprinter 1000 Discs / hour

    Sputtering Solution: PYRAMET Master Metallizer & CDM PLUS Master Metallizer
    Hard Disk Solution: CIRCULUS M14

  • 2000

    Plasma-Therm merges with Balzers BPS and becomes Unaxis group

  • 2001

    Multilayer Sputtering Solution: SPRINTER 750 13ch

    Sputtering Solution: CUBE LITE 2000 & SWIVEL 2000 2400 Discs/h
    Hard Disk Solution: CIRCULUS MX & CIRCULUS MX14 II

  • 2001

    Starline tool is introduced to the market as a one of a kind back-side metal ...

  • 2002

    Line Solution: PARAGON for DVD+RW

  • 2002

    Unaxis introduced the CLUSTERLINE® 300 for sputtering of 12” wafer size to the market

  • 2003

    Sputtering Solution: SWIVEL 2003 2600 Discs / hour & CUBE LITE 2003

    Line Solution: MATRIX for DVD ROM & FUSION for DVD-R

  • 2003

    100th CCLUSTERLINE® System delivered

  • 2004

    Multilayer Sputtering Solution: DVD SPRINTER Ultraspeed 1440 Discs / hour

    Sputtering Solution: CUBE STAR 4000 Discs / hour
    Line Solution: OFFLINE BONDER for DVD R SL and DL

  • 2004

    100<sup>th</sup> Photomask Plasma Etch System delivered.

    Versaline modular plasma process platform introduced to the market.
    Evaporation products divested to Evatech.

  • 2005

    Multilayer Sputtering Solutions

    Multilayer Sputtering Solution: SPRINTER-5 for BD R inorganic media & SPRINTER 750 13ch for MiniDisc
    Line Solution: MATRIX for HD-DVD ROM & FUSION for DVD R DL

  • 2005

    Flagship CLUSTERLINE® 200 II latest generation high performance 200mm cluster tool ...

  • 2006

    Wafer processing unveils MASK ETCHER V, the fifth generation plasma Photomask etch ...

  • 2006

    Hard Disk Solution: RACETRACK

    Line Solution: INDIGO for BD ROM & INDIGO R/RE for BD R/RE

  • 2007

    Wafer Processing awarded VLSI 10 best ranking for eight consecutive year

  • 2008

    Wafer Processing awarded VLSI 10 best ranking #3 for nine consecutive year

  • 2009

    Wafer Processing awarded VLSI 10 best ranking #3 for 10th consecutive year

  • 2009

    Oerlikon Systems launchs SOLARIS, an advanced nanotechnology solution for clean energy ...

  • 2010

    Oerlikon Systems SOLARIS wins the prestigious Solar Industry Award 2010

  • 2010

    Oerlikon Systems awarded VLSI 10 best ranking #1 for 11th consecutive year

  • 2011

    Oerlikon Systems launchs the new HEXAGON, an Advanced Packaging Solution for high ...

  • 2011

    Oerlikon Systems awarded VLSI 10 best ranking #1 for 12th consecutive year

  • 2012

    Oerlikon Systems awarded VLSI #1 winner of the "THE BEST" Small Suppliers of ...