Plasma-Therm Inc. founded as RF generator and analytical equipment company
Plasma Therm shipped first RF based plasma process equipment.
Balzers introduces the LLS 801 a batch sputter system to the market
Balzers introduces the SWS the first single wafer sputtering system worldwide
Industry first single wafer production plasma etch reactor by Plasma- Therm
First production 200mm plasma etch equipment introduced to the market by Plasma- Therm
Balzers launches their 1st gen. innovative high through-put PVD cluster tool called ...
Balzers introduces the LLS 900, the second generation batch sputter system
Plasma-Therm Inc. relocates production facility to Florida
Multilayer Solution: SDS 100
Sputtering Solution: CDI 901 1000 Discs / hour
Hard Disk Solution: CIRCULUS M8
Merger between Balzers/Liechtenstein and Leybold group in Germany completed
Sputtering Solution: CDI 915 1800 Discs / hour
First ever Photomask plasma etch system introduced to the market
Balzers introduces the LLS 502, the third generation batch sputter system
Multi Layer Solution: SDS 131
Sputtering Solution: CUBE
Flagship Versalock multi-chamber platform for production wafer processing created
Multilayer Solution: SPRINTER 500
Hard Disk Solution: CIRCULUS M12
Multilayer Solution BIG SPRINTER 500
Sputtering Solution: TWISTER 1200 Discs / hour & CUBE LITE
Unaxis introduces the Clusterline 200 to the market
Unaxis introduces the Clusterline 200 to the market, which is their 3rd gen. multi-chamber PVD cluster tool for up to 200 mm wafers.
Sputtering Solution: TWISTER 2 1450 Discs / hour & COMET & SWIVEL98 2200 Discs / hour
Hard Disk Solution: CIRCULUS M14
Multilayer Sputtering Solution: Multi SPRINTER 1500 & SPRINTER 750
Multilayer Sputtering Solution: DVD Sprinter 1000 Discs / hour
Sputtering Solution: PYRAMET Master Metallizer & CDM PLUS Master Metallizer
Hard Disk Solution: CIRCULUS M14
Plasma-Therm merges with Balzers BPS and becomes Unaxis group
Multilayer Sputtering Solution: SPRINTER 750 13ch
Sputtering Solution: CUBE LITE 2000 & SWIVEL 2000 2400 Discs/h
Hard Disk Solution: CIRCULUS MX & CIRCULUS MX14 II
Starline tool is introduced to the market as a one of a kind back-side metal ...
Line Solution: PARAGON for DVD+RW
Unaxis introduced the Clusterline 300 for sputtering of 12” wafer size to the market
Sputtering Solution: SWIVEL 2003 2600 Discs / hour & CUBE LITE 2003
Line Solution: MATRIX for DVD ROM & FUSION for DVD-R
100th CLUSTERLINE System delivered
Multilayer Sputtering Solution: DVD SPRINTER Ultraspeed 1440 Discs / hour
Sputtering Solution: CUBE STAR 4000 Discs / hour
Line Solution: OFFLINE BONDER for DVD R SL and DL
100<sup>th</sup> Photomask Plasma Etch System delivered.
Versaline modular plasma process platform introduced to the market.
Evaporation products divested to Evatech.
Multilayer Sputtering Solutions
Multilayer Sputtering Solution: SPRINTER-5 for BD R inorganic media & SPRINTER 750 13ch for MiniDisc
Line Solution: MATRIX for HD-DVD ROM & FUSION for DVD R DL
Flagship Clusterline 200 II latest generation high performance 200mm cluster tool ...
Wafer processing unveils MASK ETCHER V, the fifth generation plasma Photomask etch ...
Hard Disk Solution: RACETRACK
Line Solution: INDIGO for BD ROM & INDIGO R/RE for BD R/RE
Wafer Processing awarded VLSI 10 best ranking for eight consecutive year
Wafer Processing awarded VLSI 10 best ranking #3 for nine consecutive year
Wafer Processing awarded VLSI 10 best ranking #3 for 10th consecutive year
Oerlikon Systems launchs SOLARIS, an advanced nanotechnology solution for clean energy ...
Oerlikon Systems SOLARIS wins the prestigious Solar Industry Award 2010
Oerlikon Systems awarded VLSI 10 best ranking #1 for 11th consecutive year
Oerlikon Systems launchs the new HEXAGON, an Advanced Packaging Solution for high ...
Oerlikon Systems awarded VLSI 10 best ranking #1 for 12th consecutive year
Oerlikon Systems awarded VLSI #1 winner of the "THE BEST" Small Suppliers of ...