PACVD Plasma-assisted Chemical Vapour DepositionOerlikon Balzers produces metal-free carbon coatings using the high-frequency PACVD process.
The set-up for this process is similar to that for sputtering, which is frequently used in combination with CVD. In PACVD a gas containing the coating elements is introduced into the vacuum chamber and a discharge powered by an AC voltage is ignited.
This creates free carbon and hydrogen atoms (ions and radicals) that form a dense coating on the tools and components. Coating properties can be influenced by varying the applied voltage.
- 1. Argon
- 2. Reactive gas
- 3. Components
- 4. Plasma sheath
- 5. High-frequency connection
- 6. Vacuum pump